ISSN: 17493471
Online ISSN: 17493471
First published in 2018
2 issues per volume
Current Issue:
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Editorial and Advisory Boards

Editorial Board:

 

Dagmar Steffen, 

Lucerne University of Applied Sciences and Arts,

Switzerland

 

Erik Stolterman, 

Indiana University Bloomington, USA

 

Faith Kane, 

Massey University Wellington, New Zealand

 

Ilpo Koskinen, 

The Hong Kong Polytechnic University, Hong Kong

 

Jan Michl, 

Norway

 

John Stevens, 

Royal College of Art, UK

 

Jørgen Rasmussen, 

Aarhus School of Architecture, Denmark

 

Ken Friedman,

Tongji University College of Design and Innovation,

Shanghai, China

 

Klaus Krippendorff, 

University of Pennsylvania, USA

 

Mathilda Tham, 

Linnaeus University, Sweden, and Goldsmiths

University of London, UK

 

Nithikul Nimkulrat, 

Estonian Academy of Art, Estonia

 

Oscar Tomico, 

Eindhoven University of Technology, The

Netherlands

 

Sarah Kettley, 

Nottingham Trent University, UK

 

Tao Huang,

Southern Illinois University at Carbondale

 

Thomas Markussen, 

University of Southern Denmark, Denmark

 

Yanki Lee, 

Linnaeus University, Sweden, and Hong Kong

Design Institute, Hong Kong

 

Yoko Akama, 

RMIT University, Australia

 

Yukari Nagai, 

Japan Advanced Institute of Science and

Technology Design, Japan

 

Daniela Rosner

University of Washington, USA

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